deposition simulation
**Deposition Simulation** uses computational models to predict thin film growth, enabling process optimization before expensive experimental runs.
## What Is Deposition Simulation?
- **Physics**: Models surface kinetics, gas transport, plasma chemistry
- **Outputs**: Film thickness, uniformity, composition profiles
- **Software**: COMSOL, Silvaco ATHENA, Synopsis TCAD
- **Scale**: Reactor-level to atomic-level models
## Why Deposition Simulation Matters
A single CVD tool costs $5-20M. Simulation reduces trial-and-error experimentation, accelerating process development and improving uniformity.
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**Simulation Types**:
| Model | Physics | Application |
|-------|---------|-------------|
| CFD | Gas dynamics | Uniformity prediction |
| Kinetic MC | Surface reactions | Conformality |
| Plasma model | Ion/radical transport | PECVD/PVD |
| MD | Atomic interactions | Interface quality |