fab-wide control

Fab-wide control uses metrology data aggregated across all process tools and modules to maintain process targets, optimize yield, and enable holistic manufacturing management. **Scope**: Integrates data from lithography, etch, deposition, CMP, implant, and metrology across the entire fab. **Central database**: All tool data, metrology results, and lot history stored in centralized Manufacturing Execution System (MES) and data warehouse. **Cross-module correlation**: Identify relationships between upstream process variations and downstream device performance. Example: CVD thickness variation correlating with CMP non-uniformity and final parametric results. **Tool matching**: Ensure all tools of the same type produce equivalent results. Chamber matching for multi-chamber tools. Tool-to-tool offset monitoring and correction. **Virtual metrology**: Use tool sensor data and models to predict wafer-level results without physical measurement. Supplements inline metrology. **Yield management**: Correlate defect inspection data, parametric test results, and sort yield data to identify yield limiters. **Excursion detection**: Automated systems detect abnormal conditions across any tool or process, triggering alerts and lot holds. **Advanced analytics**: Machine learning and statistical methods applied to fab-wide data for predictive maintenance, recipe optimization, and yield prediction. **R2R control**: Run-to-run controllers across multiple process steps coordinated through fab-wide control architecture. **Dashboard**: Real-time visualization of fab health metrics, tool status, and yield indicators for management and engineering.