ASML is the sole manufacturer of EUV lithography systems worldwide — producing the most complex and expensive machines in semiconductor manufacturing, each costing $150M-$350M+ and enabling chip fabrication at 7nm and below.

Key Systems

• TWINSCAN NXE:3400C/3600D: Standard EUV (0.33 NA), used at 7nm-3nm nodes.
• TWINSCAN EXE:5000: High-NA EUV (0.55 NA), for 2nm and beyond.
• DUV Systems: ArF immersion (NXT:2000i) still used for less critical layers.

EUV Machine Facts

• Weight: 180 tons, size of a school bus.
• Components: 100,000+ parts from 5,000+ suppliers.
• Light Source: Laser-produced plasma (tin droplets + CO₂ laser).
• Resolution: Patterns down to ~8nm half-pitch.
• Throughput: 160+ wafers/hour.
• Installation: Requires 3 Boeing 747 cargo planes to ship.

Market Position: ASML holds 100% monopoly on EUV systems. No competitor exists or is expected for 10+ years.

ASML's EUV machines are the most critical bottleneck in semiconductor manufacturing — every advanced chip in the world depends on ASML technology.