Macro inspection uses low-magnification full-wafer scanning — quickly detecting large-area defects, scratches, and contamination across entire wafers without the time required for high-resolution inspection.
What Is Macro Inspection?
- Definition: Low-magnification (1-10×) full-wafer inspection.
- Speed: Scan entire wafer in seconds to minutes.
- Purpose: Detect large defects, scratches, contamination quickly.
What Macro Inspection Detects: Scratches, large particles, wafer handling damage, edge chipping, backside contamination, gross pattern defects.
Why Macro Inspection?
- Speed: Much faster than high-resolution inspection.
- Coverage: Entire wafer scanned quickly.
- Cost: Lower cost than detailed inspection.
- Screening: Identify wafers needing detailed inspection.
Limitations: Cannot detect small defects, limited resolution, misses sub-micron issues.
Applications: Incoming wafer inspection, post-CMP screening, handling damage detection, contamination monitoring, quick quality check.
Tools: Macro inspection systems, optical scanners, automated visual inspection.
Macro inspection is quick screening tool — rapidly identifying gross defects and wafers needing detailed inspection, balancing speed with coverage.
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