MDP (Mask Data Preparation) is the post-OPC data processing pipeline that converts the corrected design layout into the format required by the mask writer — including fracturing (converting polygons to simple shapes), proximity effect correction (PEC), job deck creation, and format conversion.

MDP Pipeline

• Fracturing: Convert complex polygons into rectangles and trapezoids that the mask writer can expose.
• PEC: Proximity Effect Correction for e-beam mask writing — correct for electron scattering dose effects.
• Biasing: Apply systematic bias corrections for mask process effects (etch bias, resist shrinkage).
• Format: Convert to mask writer input format — MEBES, VSB (Variable Shaped Beam), or multi-beam format.

Why It Matters

• Data Volume: Advanced mask data can exceed 1-10 TB after fracturing — data handling is a significant challenge.
• Write Time: Fracture strategy directly affects mask write time — optimized fracturing reduces shot count.
• Accuracy: MDP errors (wrong bias, bad fracturing) cause mask CD errors — careful QC is essential.

MDP is translating design to mask language — the data processing pipeline that converts OPC-corrected designs into executable mask writer instructions.