Run-to-Run Control is a between-lot control strategy that updates recipe setpoints using prior metrology feedback - It is a core method in modern semiconductor wafer-map analytics and process control workflows.

What Is Run-to-Run Control?

• Definition: a between-lot control strategy that updates recipe setpoints using prior metrology feedback.
• Core Mechanism: Controllers compute correction terms from lot error and process models to keep outputs centered on target.
• Operational Scope: It is applied in semiconductor manufacturing operations to improve spatial defect diagnosis, equipment matching, and closed-loop process stability.
• Failure Modes: Poorly tuned models or gains can cause correction oscillation, drift, or over-compensation.

Why Run-to-Run Control Matters

• Outcome Quality: Better methods improve decision reliability, efficiency, and measurable impact.
• Risk Management: Structured controls reduce instability, bias loops, and hidden failure modes.
• Operational Efficiency: Well-calibrated methods lower rework and accelerate learning cycles.
• Strategic Alignment: Clear metrics connect technical actions to business and sustainability goals.
• Scalable Deployment: Robust approaches transfer effectively across domains and operating conditions.

How It Is Used in Practice

• Method Selection: Choose approaches by risk profile, implementation complexity, and measurable impact.
• Calibration: Re-identify model coefficients, monitor controller stability, and govern gain updates through change control.
• Validation: Track objective metrics, compliance rates, and operational outcomes through recurring controlled reviews.

Run-to-Run Control is a high-impact method for resilient semiconductor operations execution - It provides practical closed-loop correction without requiring real-time in-chamber control.