Wafer cleaning sinks are dedicated wet benches with DI water supply for manual or semi-automated wafer rinsing operations. Purpose: Rinse wafers or cassettes after wet chemical processing. Remove chemical residues before next process step. DI water supply: Ultra-pure water with final point-of-use filtration. Continuous overflow to maintain purity. Sink design: Quartz or PFA material compatible with ultra-pure water. No metal contamination sources. Cascade rinsing: Multiple overflow tanks in series - wafers move through increasingly pure water. Efficient use of DI water. Dump rinse: Rapid fill and drain cycles for thorough rinsing. Quick dump capability. Spray rinse: Direct spray of DI water on wafers. Sometimes combined with megasonic for particle removal. Resistivity monitoring: In-situ monitors verify rinse completion when outlet resistivity approaches supply resistivity. Quick drain quick fill (QDR): Rapid cycling for effective chemical displacement. Integration: Part of wet bench processing line, often automated with robotic wafer handling.