3D NAND Reference Diagram

# Inside the 3D NAND Cell — and Why Layer Count Replaced Lithographic Pitch

a macaroni-channel charge-trap cell, and the scaling curve it made possible

RADIAL CROSS-SECTION OF ONE CELL Tungsten word line (control gate) wraps every layer — gate-all-around per cell Blocking oxide (SiO₂) stops charge escaping outward Charge-trap nitride (Si₃N₄) stores the bit — replaces floating gate Tunnel oxide electrons cross here during program/erase Polysilicon channel ("macaroni") hollow tube — current flows through its wall Dielectric core fill hollow center, no current here one vertical string of these = many planar cells, stacked

Lithographic pitch stopped scaling the planar cell around the 2010s; stacking more tungsten/oxide pairs — and later, more decks — kept density climbing instead.

CMOS-Under-Array (CuA/Xtacking) frees the die area periphery logic used to occupy, by bonding it face-to-face beneath the array — stacking that works alongside deck-stacking, not against it.

LAYER COUNT REPLACED LITHOGRAPHIC PITCH once planar cells stopped shrinking, this became the scaling metric layers generation (year) → single-deck etch ceiling (~96-ish layers) 2013 2017 2019 2021 2024 32L 64L ~96L — 1 deck tops out 176L — 2-3 decks joined 300L+ — 3-4 decks + CuA each jump = one more deck joined, not a smaller pitch

For the invention history of charge-trap storage, see eprom_eeprom_history · for a denser single-article treatment, see nand_complete_art / nand_400_layer_art

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