integrated metrology

**Integrated Metrology** is the **placement of metrology sensors directly within or attached to production process tools** — enabling measurement of every wafer immediately after processing without transporting wafers to standalone metrology equipment. **Types of Integrated Metrology** - **In-Situ**: Sensor inside the process chamber, measuring during processing (e.g., in-situ ellipsometry during CVD). - **In-Line**: Sensor on the process tool platform, measuring immediately after processing. - **Examples**: Reflectometry in etch tools (endpoint), ellipsometry in CVD tools (thickness), OCD in litho tracks (CD). **Why It Matters** - **Speed**: No queue time at standalone metrology tools — immediate feedback for process control. - **100% Measurement**: Can measure every wafer, lot, or even every wafer site — not just sampled wafers. - **Closed-Loop Control**: Enables real-time feed-forward and feedback process control. **Integrated Metrology** is **metrology at the point of production** — embedding sensors in process tools for immediate, high-throughput process monitoring.