mask data preparation

**MDP** (Mask Data Preparation) is the **post-OPC data processing pipeline that converts the corrected design layout into the format required by the mask writer** — including fracturing (converting polygons to simple shapes), proximity effect correction (PEC), job deck creation, and format conversion. **MDP Pipeline** - **Fracturing**: Convert complex polygons into rectangles and trapezoids that the mask writer can expose. - **PEC**: Proximity Effect Correction for e-beam mask writing — correct for electron scattering dose effects. - **Biasing**: Apply systematic bias corrections for mask process effects (etch bias, resist shrinkage). - **Format**: Convert to mask writer input format — MEBES, VSB (Variable Shaped Beam), or multi-beam format. **Why It Matters** - **Data Volume**: Advanced mask data can exceed 1-10 TB after fracturing — data handling is a significant challenge. - **Write Time**: Fracture strategy directly affects mask write time — optimized fracturing reduces shot count. - **Accuracy**: MDP errors (wrong bias, bad fracturing) cause mask CD errors — careful QC is essential. **MDP** is **translating design to mask language** — the data processing pipeline that converts OPC-corrected designs into executable mask writer instructions.