MOSFET 1962 Step 19 Fairchild Process Work Handoff Silicongate

# Name What Fairchild Was Already Building: the Process Work This Series Hands Off, Without Retelling

## 1. A Real Thread, Not a Forced One

Step 13 of this extension already named Fairchild's 1962 MOS program as process-control-focused rather than commercially rushed; the genuine continuation of that specific thread is this project's own siliconGate_1967 series, which covers the self-aligned polysilicon-gate process Fairchild released in 1967-68. That connection is real and traceable -- the same institution, the same underlying device family, five years of internal process refinement between them -- which is different from an invented handoff asserted without evidence.

A Traceable Institutional Thread, Not an Invented One fairchild 1962 to fairchild 1967, the same program maturing FAIRCHILD, 1962 process-control priority step 13 of this extension metal-gate mos still FIVE YEARS INTERNAL WORK oxide cleanliness refined alignment tolerance studied not covered by this series SILICONGATE_1967 SERIES self-aligned polysilicon gate this project's own series named here, not retold This step names the destination series and the institutional link; it does not describe the 1967 process itself.

## 2. What This Series Still Does Not Claim

This series' own content, steps 1 through this one, describes only the metal-gate, non-self-aligned device: it does not describe polysilicon deposition, self-aligned diffusion, or any 1967-era process step, all of which belong to siliconGate_1967 and are covered there in full. The handoff named here is deliberately thin -- an institutional and technical pointer, not a preview that would duplicate that series' own content.

What Transfers to the Next Series vs. What Stays Here a pointer, not a preview 100 Metal-gate device physics (here) 2 Self-aligned process detail (there) This extension keeps essentially all of the self-aligned process content in siliconGate_1967, where it belongs.

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