Lithography Aerial-Image Simulator

Image a line/space grating through a partially coherent projection lens and predict what actually prints: the aerial-image cross-section, printed CD, image contrast and NILS, the k1 factor and Rayleigh resolution limit, depth of focus and exposure latitude. Explore numerical aperture, partial coherence, off-axis illumination (annular / dipole), attenuated phase-shift masks, defocus, and EUV vs 193i immersion. Runs on the ChipFoundryServices distributed compute pool. Reduced-order educational model. See also the etch, deposition and inference simulators and the compute-pool status.

193i · dense 193i · dipole 193i · annular EUV 13.5 Isolated line
Optical system
Mask (line/space)
Process
Developer API — same model over HTTP (load-balanced across the pool): 
curl -X POST https://www.chipfoundryservices.com/edge/litho \
  -H "Content-Type: application/json" \
  -d '{"wavelength_nm":193,"na":1.35,"sigma":0.9,"illumination":"dipole",
       "pitch_nm":100,"linewidth_nm":50,"mask_type":"binary","defocus_nm":0}'
Returns JSON with outputs (printed CD, contrast, NILS, k1, Rayleigh limit, depth of focus, exposure latitude, orders captured), the profile.aerial cross-section, the serving node, and compute_ms.