Silicongate 1967 Step 19 Metallization Interconnect Open Thread
# Leave This Open Honestly: the Interconnect Problem Silicon Gate Itself Creates Next
## 1. A Problem This Series Creates but Does Not Solve
Step 6 of this series already identified polysilicon's own sheet resistance as a new RC-delay problem the metal-gate device never had; what this step adds, honestly, is that this series does not resolve that problem -- it only measures and dopes around it. As transistor counts per chip grew through the 1970s (the adoption curve Step 17 of this extension traces), polysilicon-only interconnect and gate wiring became an increasingly binding speed limit of its own, a genuinely open thread this series does not claim to close.
## 2. Why This Series Does Not Reach for a Specific Named Successor Here
A careful check of this project's existing content finds no already-deployed series dedicated specifically to metal interconnect or silicide/salicide gate technology that this step could honestly point to as the resolution -- rather than invent a handoff target that does not yet exist in this project, this step names the open problem and stops, consistent with this project's own house-style rule against forcing an artificial handoff where none is actually documented.