1,706 technical terms and definitions
dps etch chamber, plasma density vs ion bombardment energy, dual rf source etch, icp etch tool architecture, plasma etch tool design
A decoupled plasma source is the etch-tool architecture that solves a fundamental tension in plasma etching: generating a dense enough plasma to etch efficiently, while…
A decoupling capacitor is a small capacitor placed physically close to a chip's power pins that acts as a local reservoir of charge, supplying the sudden bursts of current…
A die shrink is the process of re-implementing an existing chip design on a smaller, more advanced manufacturing process node, reducing the physical size of the chip while…
A duplexer is a component that allows a radio device to transmit and receive signals simultaneously using a single shared antenna, by separating the outgoing and incoming signals…
Defect density is a measure of how many manufacturing defects occur per unit area of a wafer, used as a key indicator of a fabrication process's health and a critical input…
Dual damascene is an interconnect fabrication technique that etches both a via hole and its overlying metal trench into the insulating layer before a single metal fill, forming…