dsa (directed self-assembly),dsa,directed self-assembly,lithography
Use block copolymers to form nanoscale patterns.
58 technical terms and definitions
Use block copolymers to form nanoscale patterns.
Two-sided QFN.
Through-hole with two rows of pins.
Combined FIB and SEM system.
Blank wafer used to fill chamber or stabilize process.
Lithography using 193nm or 248nm wavelength.
Range from detection limit to saturation.
Use ion bombardment for depth profile.