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Glossary

3,822 technical terms and definitions

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Programmable Logic Device

PLD, user-configurable logic, PAL CPLD FPGA, custom logic without custom chip, reconfigurable chip

A programmable logic device is a chip whose logic function can be configured by the user after manufacture, rather than being fixed when the chip is made, giving designers a way…

Projection Aligner

projection lithography, photolithography, mask projection, contact printing replacement, wafer exposure

A projection aligner is a photolithography machine that transfers a mask pattern onto a wafer by projecting an image of the mask through a lens system onto the wafer's surface…

Micralign Projection Lithography Cross Section

contact printing mask damage, catadioptric optics working gap, projection lithography reference diagram

The Working Gap That Ended Mask-Wafer Contact Perkin-Elmer's Micralign (1973) — what the gap looks like, and what it bought in yield and mask life One contact event compounds…

Confront Contact Printings Mask Damage Problem

projection lithography, projection lithography 1973

Confront Contact Printing's Mask-Damage Problem The original 1957-era photolithography process pressed the mask directly against the photoresist-coated wafer during exposure…

Name Defect Generation and Yield Loss from Contact

perkin elmer micralign, projection lithography 1973

Name Defect Generation and Yield Loss From Contact Every contact exposure risked transferring a defect two ways at once: a particle on the wafer could scratch the mask, and a flaw…

Introduce Projection Alignment as the Fix

catadioptric optics, projection lithography 1973

Introduce Projection (Non-Contact) Alignment as the Fix The fix that defined this generation of lithography was to stop touching the mask to the wafer at all, and instead project…

Define the Mask to Wafer Working Gap

non contact exposure, projection lithography 1973

Define the Mask-to-Wafer Working Gap Removing physical contact meant introducing a deliberate working gap between the mask and the wafer, with an optical system filling that gap…

Name Perkin Elmer and the Micralign System 1973

mask lifetime, projection lithography 1973

Name Perkin-Elmer and the Micralign System (1973) Perkin-Elmer introduced the Micralign system in 1973 as the production-ready answer to contact printing's defect…

Explain the Reflective Catadioptric Optical System

lithography yield, projection lithography 1973

Explain the Reflective (Catadioptric) Optical System Micralign used a catadioptric optical design, combining reflective mirror elements with refractive lens elements rather than…

Detail 1 to 1 Imaging and the Scanning Slit

perkin elmer micralign, projection lithography 1973

Detail 1:1 Imaging and the Scanning Slit Micralign projected the mask pattern onto the wafer at 1:1 scale, meaning the image on the wafer was the same size as the pattern on…

Quantify Micralign Throughput over Contact Aligners

catadioptric optics, projection lithography 1973

Quantify Micralign's Throughput Advantage Over Contact Aligners Contact aligners had to handle each wafer carefully to control contact force and avoid damaging either the mask…

Quantify Mask Lifetime Extension from Eliminating Contact

non contact exposure, projection lithography 1973

Quantify Mask-Lifetime Extension From Eliminating Contact A contact-printing mask wore out through repeated physical contact, accumulating scratches and embedded particles until…

Quantify Wafer Defect Reduction and Yield Improvement

mask lifetime, projection lithography 1973

Quantify Wafer Defect Reduction and Yield Improvement Removing the contact-driven scratch-and-transfer defect mechanism directly reduced the number of pattern defects printed onto…

Trace Micralign Adoption Across the Industry

lithography yield, projection lithography 1973

Trace Micralign's Adoption Across the Industry Chipmakers evaluating Micralign against their existing contact-printing lines weighed the new system's higher throughput, extended…

Explain Resolution Limits of Projection Scanning Systems

projection lithography, projection lithography 1973

Explain Resolution Limits of Projection Scanning Systems Even without the defect problems of contact printing, Micralign's optical system still had a finite resolution limit, set…

Quantify Alignment Accuracy Gains over Contact Methods

perkin elmer micralign, projection lithography 1973

Quantify Alignment Accuracy Gains Over Contact Methods Contact aligners relied on direct mechanical registration between mask and wafer, which was limited by how precisely…

Describe Micralign Model Generations and Refinements

catadioptric optics, projection lithography 1973

Describe Micralign Model Generations and Refinements Perkin-Elmer did not stop at the original 1973 Micralign design, and refined successive models with improvements…

Quantify the Economic Impact on Cost per Good Die

non contact exposure, projection lithography 1973

Quantify the Economic Impact on Cost per Good Die Cost per good die, not cost per wafer exposed, was the metric that actually determined whether switching to projection…

Name Competing Non Contact Approaches Considered

mask lifetime, projection lithography 1973

Name Competing Non-Contact Approaches Considered Projection was not the only non-contact idea explored to solve contact printing's defect problem; proximity printing, which held…

Proximity Printing

proximity lithography, mask gap, contact printing, diffraction limit, shadow printing

Proximity printing is a photolithography method in which the mask is held a small distance above the wafer during exposure rather than pressed directly against it, a compromise…

Ptychography

metrology

Ptychography is a computational imaging technique that recovers both the amplitude and phase of a transmitted wave by scanning a coherent probe across overlapping positions…

Pupil Fill Illumination Source Shape

off axis illumination lithography, source mask optimization, dipole quadrupole illumination

Pupil Fill and Illumination Source Shape A lithography scanner's illumination doesn't have to fill its pupil uniformly, and for anything near the resolution limit, it shouldn't.…

Pure-Play Foundry

business & strategy, integrated device manufacturer, IDM, foundry neutrality, competitor trust, customer IP protection, capacity allocation, manufacturing as a service, fabless customer

A pure-play foundry manufactures chips for other companies without designing or selling any competing end products of its own — it makes money purely from manufacturing, never…

Purity

semiconductor purity, nine nines, 9N purity, electronic-grade polysilicon, Siemens process, ultrapure water, cleanroom contamination

Purity, in semiconductor manufacturing, is the fraction of a material that is the intended element, and it is quoted in nines: 99.9999999 percent, nine nines, usually written 9N…

PVD

physical vapor deposition, what is pvd, sputtering, magnetron sputtering, ipvd, ionized pvd, evaporation

Physical vapor deposition is how a fab lays down most of its metal. A solid source material is physically knocked or boiled into a vapor inside a vacuum chamber, and that vapor…

PVD Chamber

physical vapor deposition chamber, pvd vacuum system, pvd base pressure, pvd chamber pressure, pvd chamber shields, pvd shield kit, pvd chamber seasoning, pvd chamber clean, pvd chamber particles, pvd chamber contamination, pvd chamber matching

A PVD chamber is a coupled vacuum, plasma, material-source, transport, wafer-handling, and contamination-control system. The film is determined not only by target power…

PVD Conformal Coverage Prediction Machine Learning

deposition modeling conformal coverage in physical vapor deposition (pvd) processes, deposition modeling conformal, modeling conformal coverage, conformal coverage physical, physical vapor

Deposition: Modeling conformal coverage in physical vapor deposition (PVD) processes Introduction & Motivation Deposition: Modeling conformal coverage in physical vapor deposition…

PVD Modeling

pvd simulation, physical vapor deposition modeling, sputter deposition modeling, pvd step coverage modeling, sputter transport model, pvd profile simulation, ionized pvd modeling, pvd deposition modeling, sputter step coverage model

PVD modeling is the calculation of where sputtered or evaporated atoms come to rest, and at the roughly 5 mTorr pressure a physical-vapor-deposition chamber runs, the mean free…

PVD Process

physical vapor deposition, sputtering basics

PVD process (physical vapor deposition) is a family of thin-film fabrication methods where solid source material is physically converted to vapor-phase species in vacuum…

Quad Flat No-Lead

qfn, packaging

Quad flat no-lead is the leadless surface-mount package with exposed perimeter pads on four sides and optional bottom thermal pad - it combines compact size, strong electrical…

Quad Flat Package

qfp, packaging

Quad flat package is the leaded package with gull-wing terminals on all four sides for higher pin count in perimeter-lead architecture - it is a long-standing package choice…

Qualification Run

production, post-PM qual, new tool qualification, process change qual, periodic requalification, monitor wafer, particle wafer, dual sign-off, production resume gate

A qualification run processes a specific set of test wafers through a tool, immediately after a preventive maintenance event or a process change, specifically to verify the tool's…

Qualification Wafers

production, tool qualification, process qualification, product qualification, AEC-Q100, regulatory documentation, customer sign-off, qualification efficiency, requalification trigger

Qualification wafers are the physical test wafers processed specifically to generate documented proof that a tool, process, or product actually meets its specifications…

Quantification Limit

metrology

Quantification Limit (LOQ — Limit of Quantification) is the lowest concentration of an analyte that can be measured with acceptable accuracy and precision — higher than…

Quantum

dot, semiconductor, technology, nanocrystal, optoelectronics, bandgap

Quantum Dot Semiconductor Technology is nanoscale semiconductor crystals (2-10 nm) exhibiting quantum confinement effects, enabling bandgap tuning via size and applications…

Quantum

secure, semiconductor, cryptography, post-quantum, key, distribution

Quantum Secure Semiconductor is semiconductor devices and chips implementing quantum-safe cryptographic algorithms and quantum key distribution, protecting against future quantum…

Quantum Chip Design Superconducting

transmon qubit design, josephson junction qubit, qubit coupling resonator, quantum processor layout, dolan bridge

Superconducting qubits and transmon architectures constitute the premier solid-state quantum computing platform fabricated using semiconductor cleanroom techniques on…

Quantum Computing Semiconductor

qubit fabrication, silicon qubit, superconducting qubit, cryo-CMOS, transmon

Superconducting qubits and transmon architectures constitute the premier solid-state quantum computing platform fabricated using semiconductor cleanroom techniques on…

Quantum Computing Semiconductor Integration

silicon spin qubit, superconducting qubit fabrication, qubit yield semiconductor, cryogenic semiconductor, transmon

Superconducting qubits and transmon architectures constitute the premier solid-state quantum computing platform fabricated using semiconductor cleanroom techniques on…

Quantum Computing Semiconductor Qubit

spin qubit silicon, singlet triplet qubit, exchange interaction qubit, silicon qubit error rate

Silicon Quantum Dot Spin Qubits is the solid-state quantum computing platform using electron spins confined in silicon quantum dots — manipulated via electrostatic gates…